A KINETIC STUDY OF THE SYSTEM SI-SICL4

[1] KINETICS OF SILICON CRYSTAL GROWTH FROM SICL4 DECOMPOSITION [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1962, 109 (12) : 1171 - 1175

[2] THE SURFACE CHEMISTRY OF GERMANIUM .2. EROSION BY CHLORINE [J]. JOURNAL OF THE CHEMICAL SOCIETY, 1960, (APR): : 1797 - 1803

[3] EPITAXIAL GROWTH OF SILICON BY HYDROGEN REDUCTION OF SIHCL3 ONTO SILICON SUBSTRATES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1962, 109 (10) : 957 - 962

[4] GLANG R, 1961, METALLURGY SEMICONDU, V15, P22

[5] SURFACE KINETICS AND PHYSICS INVESTIGATION OF REACTION BETWEEN SINGLE-CRYSTAL GERMANIUM AND IODINE [J]. JOURNAL OF APPLIED PHYSICS, 1961, 32 (08) : 1498 - +

[6] MOELWYNHUGHES EA, 1961, PHYSICAL CHEM, P1186

[7] UBER DAS REAKTIONSGLEICHGEWICHT SI+SICL4=2SICL2 UND DIE THERMOCHEMISCHEN EIGENSCHAFTEN DES GASFORMIGEN SILICIUM (II)-CHLORIDS [J]. ZEITSCHRIFT FUR ANORGANISCHE UND ALLGEMEINE CHEMIE, 1953, 274 (4-5): : 250 - 264

[8] STEINMAIER W, 1963, PHILIPS RES REP, V18, P75

[9] EPITAXIAL SILICON FILMS BY THE HYDROGEN REDUCTION OF SIC1 [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1961, 108 (07) : 649 - 653

[10] TUNG SK, 1961, METALLURGY SEMICONDU, V15, P87

[1] KINETICS OF SILICON CRYSTAL GROWTH FROM SICL4 DECOMPOSITION [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1962, 109 (12) : 1171 - 1175

[2] THE SURFACE CHEMISTRY OF GERMANIUM .2. EROSION BY CHLORINE [J]. JOURNAL OF THE CHEMICAL SOCIETY, 1960, (APR): : 1797 - 1803

[3] EPITAXIAL GROWTH OF SILICON BY HYDROGEN REDUCTION OF SIHCL3 ONTO SILICON SUBSTRATES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1962, 109 (10) : 957 - 962

[4] GLANG R, 1961, METALLURGY SEMICONDU, V15, P22

[5] SURFACE KINETICS AND PHYSICS INVESTIGATION OF REACTION BETWEEN SINGLE-CRYSTAL GERMANIUM AND IODINE [J]. JOURNAL OF APPLIED PHYSICS, 1961, 32 (08) : 1498 - +

[6] MOELWYNHUGHES EA, 1961, PHYSICAL CHEM, P1186

[7] UBER DAS REAKTIONSGLEICHGEWICHT SI+SICL4=2SICL2 UND DIE THERMOCHEMISCHEN EIGENSCHAFTEN DES GASFORMIGEN SILICIUM (II)-CHLORIDS [J]. ZEITSCHRIFT FUR ANORGANISCHE UND ALLGEMEINE CHEMIE, 1953, 274 (4-5): : 250 - 264

[8] STEINMAIER W, 1963, PHILIPS RES REP, V18, P75

[9] EPITAXIAL SILICON FILMS BY THE HYDROGEN REDUCTION OF SIC1 [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1961, 108 (07) : 649 - 653

[10] TUNG SK, 1961, METALLURGY SEMICONDU, V15, P87