EPITAXIAL SILICON FILMS BY THE HYDROGEN REDUCTION OF SIC1

[1] THE USE OF AN INTERFERENCE MICROSCOPE FOR MEASUREMENT OF EXTREMELY THIN SURFACE LAYERS [J]. BELL SYSTEM TECHNICAL JOURNAL, 1956, 35 (05): : 1209 - 1221

[2] PEARSON G, 1947, T AIEE, V60, P209

[3] PFANN WG, 1952, T AM I MIN MET ENG, V194, P747

[4] Several new halogenides of silicium II [J]. ZEITSCHRIFT FUR ANORGANISCHE UND ALLGEMEINE CHEMIE, 1938, 235 (03): : 247 - 253

[5] MEASUREMENT OF SHEET RESISTIVITIES WITH THE 4-POINT PROBE [J]. BELL SYSTEM TECHNICAL JOURNAL, 1958, 37 (03): : 711 - 718

[6] PURIFICATION OF SICL4 BY ADSORPTION TECHNIQUES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1960, 107 (01) : 29 - 32

[7] HEAT TREATMENT OF SILICON USING ZONE HEATING TECHNIQUES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1957, 104 (12) : 721 - 723

[8] THEUERER HC, 1960, P IRE, V48, P1642

[1] THE USE OF AN INTERFERENCE MICROSCOPE FOR MEASUREMENT OF EXTREMELY THIN SURFACE LAYERS [J]. BELL SYSTEM TECHNICAL JOURNAL, 1956, 35 (05): : 1209 - 1221

[2] PEARSON G, 1947, T AIEE, V60, P209

[3] PFANN WG, 1952, T AM I MIN MET ENG, V194, P747

[4] Several new halogenides of silicium II [J]. ZEITSCHRIFT FUR ANORGANISCHE UND ALLGEMEINE CHEMIE, 1938, 235 (03): : 247 - 253

[5] MEASUREMENT OF SHEET RESISTIVITIES WITH THE 4-POINT PROBE [J]. BELL SYSTEM TECHNICAL JOURNAL, 1958, 37 (03): : 711 - 718

[6] PURIFICATION OF SICL4 BY ADSORPTION TECHNIQUES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1960, 107 (01) : 29 - 32

[7] HEAT TREATMENT OF SILICON USING ZONE HEATING TECHNIQUES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1957, 104 (12) : 721 - 723

[8] THEUERER HC, 1960, P IRE, V48, P1642