STOICHIOMETRIC STUDY ON POLYCRYSTALLINE ASGA THIN-FILMS DEPOSITED BY RF-SPUTTERING

被引：4

作者：

CARCHANO, H

LALANDE, F

LOUSSIER, R

机构：

来源：

关键词：

D O I：

10.1016/0040-6090(84)90172-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：47 / 54

页数：8

共 17 条

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