PREPARATION AND PROPERTIES OF A-SI FILMS DEPOSITED AT A HIGH DEPOSITION RATE UNDER A MAGNETIC-FIELD

被引:12
作者
OHNISHI, M [1 ]
NISHIWAKI, H [1 ]
UCHIHASHI, K [1 ]
YOSHIDA, K [1 ]
TANAKA, M [1 ]
NINOMIYA, K [1 ]
NISHIKUNI, M [1 ]
NAKAMURA, N [1 ]
TSUDA, S [1 ]
NAKANO, S [1 ]
YAZAKI, T [1 ]
KUWANO, Y [1 ]
机构
[1] SANYO ELECT CO LTD,RES CTR,HIRAKATA,OSAKA 573,JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1988年 / 27卷 / 01期
关键词
D O I
10.1143/JJAP.27.40
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:40 / 46
页数:7
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