METHACRYLATED SILICONE-BASED NEGATIVE PHOTORESIST FOR HIGH-RESOLUTION BILAYER RESIST SYSTEMS

被引：16

作者：

MORITA, M

TANAKA, A

ONOSE, K

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1986年 / 4卷 / 01期

关键词：

D O I：

10.1116/1.583345

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：414 / 417

页数：4

共 17 条

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[10] A NEW SILICONE-BASED NEGATIVE RESIST (SNR) FOR 2-LAYER RESIST SYSTEM [J].

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