THE USEFUL PROPERTIES OF TINX-TI COATINGS DEPOSITED ONTO DRILLS AT 500-K USING THE REACTIVE PULSE PLASMA METHOD

被引：17

作者：

MICHALSKI, A ^{[1
]}

SOKOLOWSKA, A ^{[1
]}

LEGUTKO, S ^{[1
]}

机构：

[1] POZNAN TECH UNIV,PL-60965 POZNAN,POLAND

来源：

THIN SOLID FILMS | 1985年 / 129卷 / 3-4期

关键词：

D O I：

10.1016/0040-6090(85)90052-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：249 / 254

页数：6

共 12 条

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[6] STRUCTURE AND PROPERTIES OF COATINGS COMPOSED OF TIN-TI OBTAINED BY THE REACTIVE PULSE PLASMA METHOD [J].

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[7] REACTIVE PULSE PLASMA CRYSTALLIZATION OF TIN LAYERS ON SUBSTRATES AT 500-K [J].

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[8] DEPOSITION OF WURTZITE TYPE BORON-NITRIDE LAYERS BY REACTIVE PULSE PLASMA CRYSTALLIZATION [J].

SOKOLOWSKI, M .

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[9] THE DEPOSITION OF THIN-FILMS OF MATERIALS WITH HIGH MELTING-POINTS ON SUBSTRATES AT ROOM-TEMPERATURE USING THE PULSE PLASMA METHOD [J].

SOKOLOWSKI, M ;

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[10]

SOKOLOWSKI M, 1983, SEP P INT ION ENG C, P689

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