SPUTTERING YIELDS OF THIN-FILMS FOR MEV MICROBEAM IRRADIATION - PRELIMINARY-RESULTS

Experimental sputtering yields of thin films for 1.725 MeV H-1(+) bombardment have been measured on various targets of thicknesses from 2 to 320 nm: carbon, titanium, chromium, nickel, tantalum, tantalum oxide and gold. The results are compared to old models from Goldman and Kaminsky and to Sigmund's theory. Relatively good agreement between experimental data and theory is found. The influence of some parameters including the nature of the target, the target thickness, the nature of the substrate and the nature of the projectile is discussed.