APPLICATIONS OF NUCLEAR MICROPROBES TO SEMICONDUCTOR PROCESS-DEVELOPMENTS

被引：11

作者：

TAKAI, M ^{[1
]}

机构：

[1] OSAKA UNIV,EXTREME MAT RES CTR,TOYONAKA,OSAKA 560,JAPAN

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1995年 / 104卷 / 1-4期

关键词：

D O I：

10.1016/0168-583X(95)00392-4

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Nuclear microprobes have been applied to semiconductor process developments. Two or three-dimensional microanalyses using micro-Rutherford backscattering and channeling on miniaturized structures have been demonstrated. Optimization of memory device structures using soft error mapping and ion beam induced current (IBIC) measurements has been described. Issues arising from microprobe analyses have been discussed.

引用

页码：501 / 507

页数：7

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