LOW-TEMPERATURE SURFACE CLEANING OF GAAS BY ELECTRON-CYCLOTRON RESONANCE (ECR) PLASMA

被引：59

作者：

KONDO, N

NANISHI, Y

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1989年 / 28卷 / 01期

关键词：

D O I：

10.1143/JJAP.28.L7

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L7 / L9

页数：3

共 4 条

[1] KONDO N, 1988, AIP C P, V167
[2] LOW-ENERGY ION EXTRACTION WITH SMALL DISPERSION FROM AN ELECTRON-CYCLOTRON RESONANCE MICROWAVE PLASMA STREAM
MATSUOKA, M
ONO, K
[J]. APPLIED PHYSICS LETTERS, 1987, 50 (26) : 1864 - 1866
[3] GAAS CLEANING WITH A HYDROGEN RADICAL BEAM GUN IN AN ULTRAHIGH-VACUUM SYSTEM
SUGATA, S
TAKAMORI, A
TAKADO, N
ASAKAWA, K
MIYAUCHI, E
HASHIMOTO, H
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (04): : 1087 - 1091
[4] CLEANING OF MBE GAAS SUBSTRATES BY HYDROGEN RADICAL BEAM IRRADIATION
TAKAMORI, A
SUGATA, S
ASAKAWA, K
MIYAUCHI, E
HASHIMOTO, H
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1987, 26 (02): : L142 - L144