CORE-LEVEL SHIFTS AND OXIDATION-STATES OF TA AND W - ELECTRON-SPECTROSCOPY FOR CHEMICAL-ANALYSIS APPLIED TO SURFACES

被引:102
作者
HIMPSEL, FJ [1 ]
MORAR, JF [1 ]
MCFEELY, FR [1 ]
POLLAK, RA [1 ]
HOLLINGER, G [1 ]
机构
[1] UNIV LYON 1,INST PHYS NUCL,F-69622 VILLEURBANNE,FRANCE
来源
PHYSICAL REVIEW B | 1984年 / 30卷 / 12期
关键词
D O I
10.1103/PhysRevB.30.7236
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:7236 / 7241
页数:6
相关论文
共 19 条
  • [1] COMBINED SIMS, AES, AND XPS INVESTIGATIONS OF TANTALUM OXIDE LAYERS
    BISPINCK, H
    GANSCHOW, O
    WIEDMANN, L
    BENNINGHOVEN, A
    [J]. APPLIED PHYSICS, 1979, 18 (02): : 113 - 117
  • [2] BRUNDLE CR, UNPUB
  • [3] Cotton F.A., 1972, ADV INORGANIC CHEM
  • [4] AN ELLIPSOIDAL MIRROR DISPLAY ANALYZER SYSTEM FOR ELECTRON-ENERGY AND ANGULAR MEASUREMENTS
    EASTMAN, DE
    DONELON, JJ
    HIEN, NC
    HIMPSEL, FJ
    [J]. NUCLEAR INSTRUMENTS & METHODS, 1980, 172 (1-2): : 327 - 336
  • [5] XPS STUDIES ON WO2.90 AND WO2.72 AND THE INFLUENCE OF METALLIC IMPURITIES
    GEHLIG, R
    SALJE, E
    CARLEY, AF
    ROBERTS, MW
    [J]. JOURNAL OF SOLID STATE CHEMISTRY, 1983, 49 (03) : 318 - 324
  • [6] PROBING THE TRANSITION LAYER AT THE SIO2-SI INTERFACE USING CORE LEVEL PHOTOEMISSION
    HOLLINGER, G
    HIMPSEL, FJ
    [J]. APPLIED PHYSICS LETTERS, 1984, 44 (01) : 93 - 95
  • [7] MULTIPLE-BONDING CONFIGURATIONS FOR OXYGEN ON SILICON SURFACES
    HOLLINGER, G
    HIMPSEL, FJ
    [J]. PHYSICAL REVIEW B, 1983, 28 (06) : 3651 - 3653
  • [8] HOLLINGER G, 1979, THESIS U LYON FRANCE
  • [9] Kofstad P., 1972, NONSTOICHIOMETRY DIF
  • [10] CONTRIBUTION TO THE STUDY OF THE TA-O2 REACTION AT ELEVATED-TEMPERATURES AND LOW-PRESSURES .2. STUDY FOR CHEMICAL-ANALYSIS BY ELECTRON-SPECTROSCOPY
    LEGMA, B
    SIMON, D
    BAILLIF, P
    BARDOLLE, J
    [J]. JOURNAL OF THE LESS-COMMON METALS, 1983, 95 (01): : 37 - 46