REDUCTION OF THE CONCENTRATION OF SLOW INSULATOR STATES IN SIO2/INP METAL-INSULATOR SEMICONDUCTOR STRUCTURES

被引：30

作者：

KULISCH, W

KASSING, R

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 02期

关键词：

D O I：

10.1116/1.583943

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

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页码：523 / 529

页数：7

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