X-RAY TOPOGRAPHY OF GROWTH STRIATIONS IN CZOCHRALSKI-GROWN SI WAFERS

被引：5

作者：

IMAI, M

NODA, H

SHIBATA, M

YATSURUGI, Y

机构：

来源：

APPLIED PHYSICS LETTERS | 1987年 / 50卷 / 07期

关键词：

D O I：

10.1063/1.98210

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：395 / 397

页数：3

共 11 条

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[7]

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[10]

SUMINO K, 1983, PHILOS MAG A, V47, P753, DOI 10.1080/01418618308245262

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