OPTICAL-PROPERTIES OF TANTALUM OXIDE-FILMS ON SILICON

被引：21

作者：

REVESZ, AG ^{[1
]}

REYNOLDS, JH ^{[1
]}

ALLISON, JF ^{[1
]}

机构：

[1] COMSAT LABS,CLARKSBURG,MD 20734

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1976年 / 123卷 / 06期

关键词：

D O I：

10.1149/1.2132963

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：889 / 894

页数：6

共 22 条

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[7] TANTALUM OXIDE LIGHT GUIDE ON LITHIUM TANTALATE [J].

LEE, YK ;

WANG, S .

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[8] ANALYSIS OF THIN-FILM STRUCTURES WITH NUCLEAR BACKSCATTERING AND X-RAY-DIFFRACTION [J].

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[9]

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[10] POLISHING OF SILICON BY CUPRIC ION PROCESS [J].

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