MICROSTRUCTURE OF COCR THIN-FILMS PREPARED BY SPUTTERING

被引：21

作者：

FUTAMOTO, M

HONDA, Y

KAKIBAYASHI, H

SHIMOTSU, T

UESAKA, Y

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1985年 / 24卷 / 06期

关键词：

D O I：

10.1143/JJAP.24.L460

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：L460 / L462

页数：3

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[1] A COMPARISON OF THE UNIAXIAL ANISOTROPY IN SPUTTERED CO-RE AND CO-CR PERPENDICULAR RECORDING MEDIA
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