OXYGEN RIE-RESISTANT DEEP-UV POSITIVE RESISTS - POLY (TRIMETHYLSILYLMETHYL METHACRYLATE) AND POLY (TRIMETHYLSILYLMETHYL METHACRYLATE-CO-3-OXIMO-2-BUTANONE METHACRYLATE)

被引：28

作者：

REICHMANIS, E

SMOLINSKY, G

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1985年 / 132卷 / 05期

关键词：

D O I：

10.1149/1.2114054

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1178 / 1182

页数：5

共 10 条

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[8] PRELIMINARY EVALUATION OF CO-POLYMERS OF METHYL-METHACRYLATE AND ACYLOXIMINO METHACRYLATE AS DEEP UV RESISTS [J].

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REICHMANIS, E ;

CHANDROSS, EA .

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