THE REACTION OF ATOMIC AND MOLECULAR CHLORINE WITH ALUMINUM

被引:5
作者
DANNER, DA [1 ]
HESS, DW [1 ]
机构
[1] UNIV CALIF BERKELEY,DEPT CHEM ENGN,BERKELEY,CA 94720
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 03期
关键词
D O I
10.1116/1.573800
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:748 / 748
页数:1
相关论文
共 7 条
[1]   RECOMBINATION OF GROUND STATE HALOGEN ATOMS .2. KINETICS OF OVERALL RECOMBINATION OF CHLORINE ATOMS [J].
CLYNE, MAA ;
STEDMAN, DH .
TRANSACTIONS OF THE FARADAY SOCIETY, 1968, 64 (550P) :2698-&
[2]  
CLYNE MAA, 1979, REACTIVE INTERMEDIAT, pCH1
[3]   THE EFFECT OF TEMPERATURE AND FLOW-RATE ON ALUMINUM ETCH RATES IN RF PLASMAS [J].
DANNER, DA ;
HESS, DW .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (01) :151-155
[4]  
DANNER DA, UNPUB J APPL PHYS
[5]  
HESS DW, 1984, DRY ETCHING MICROELE, pCH1
[6]   CHLORINE ADSORPTION ON CLEAN ALUMINUM [J].
SMITH, T .
SURFACE SCIENCE, 1972, 32 (03) :527-&
[7]   ETCH PRODUCTS FROM THE REACTION ON CL-2 WITH AL(100) AND CU(100) AND XEF2 WITH W(111) AND NB [J].
WINTERS, HF .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01) :9-15