共 23 条
- [1] PLASMA-ETCHING OF NIOBIUM WITH CF4/O2 GASES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (02): : 708 - 711
- [3] COBURN JL, UNPUB
- [4] PLASMA-ETCHING - DISCUSSION OF MECHANISMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 391 - 403
- [5] PLASMA-ASSISTED ETCHING IN MICROFABRICATION [J]. ANNUAL REVIEW OF MATERIALS SCIENCE, 1983, 13 : 91 - 116
- [6] Flamm D.L., 1981, PLASMA CHEM PLASMA P, V1, P317, DOI [10.1007/bf00565992, DOI 10.1007/BF00565992]
- [7] REACTIVE ION ETCHING OF NIOBIUM [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1394 - 1397
- [9] Hess D.W., 1982, PLASMA CHEM PLASMA P, V2, P141, DOI [10.1007/BF00633130, DOI 10.1007/BF00633130]
- [10] ARGON-ION ASSISTED ETCHING OF SILICON BY MOLECULAR CHLORINE [J]. JOURNAL OF APPLIED PHYSICS, 1984, 55 (10) : 3813 - 3818