PLASMA-ETCHING OF NIOBIUM WITH CF4/O2 GASES

被引：17

作者：

CHEN, MM

WANG, RH

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1983年 / 1卷 / 02期

关键词：

D O I：

10.1116/1.571983

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：708 / 711

页数：4

共 8 条

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[7]

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