PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION OF TITANIUM NITRIDE IN A CAPACITIVELY COUPLED RADIO-FREQUENCY DISCHARGE

被引：42

作者：

LAIMER, J ^{[1
]}

STORI, H ^{[1
]}

RODHAMMER, P ^{[1
]}

机构：

[1] MET WERK PLANSEE GMBH,A-6600 REUTTE,AUSTRIA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 05期

关键词：

D O I：

10.1116/1.576173

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2952 / 2959

页数：8

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