INCREASE OF COERCIVE FORCE IN SPUTTERED HARD DISK

被引:13
作者
TANI, N
HASHIMOTO, M
ISHIKAWA, M
OTA, Y
NAKAMURA, K
ITOH, A
机构
[1] Institute for Super Materials, ULVAC Japan. Ltd., Chiba, 289-12, 523 Yokota, Sanbu
关键词
D O I
10.1109/20.54013
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A study was made to increase the coercive force in Co-NiCr/Cr sputtered hard disk media. It was found that a higher coercive force could be obtained when the substrate temperature was higher and a negative bias voltage was applied to a substrate during sputtering. With optimized conditions, a coercive force of more than 2300 Oe was obtained. It is considered that the increase of coercive force is due to the enhancement of isolation between magnetic particles by developing the segregation of Cr in CoNiCr film. © 1990 IEEE
引用
收藏
页码:1282 / 1285
页数:4
相关论文
共 6 条
[1]   A COMPARISON OF THE MAGNETIC AND RECORDING PROPERTIES OF SPUTTERED TERNARY ALLOYS FOR HIGH-DENSITY APPLICATIONS [J].
ALLAN, JC ;
FISHER, RD .
IEEE TRANSACTIONS ON MAGNETICS, 1987, 23 (01) :122-124
[2]   FILM STRUCTURE AND MAGNETIC-PROPERTIES OF CONICR/CR SPUTTERED THIN-FILM [J].
ISHIKAWA, M ;
TANI, N ;
YAMADA, T ;
OTA, Y ;
NAKAMURA, K ;
ITOH, A .
IEEE TRANSACTIONS ON MAGNETICS, 1986, 22 (05) :573-575
[3]  
ISHIKAWA M, 1987, 11TH ANN C MAGN JAP, P18
[4]  
TANI N, 1985, 32ND SPRING M, P357
[5]   SPUTTERING TARGET FOR PRODUCTION OF CONICR/CR SPUTTERED HARD DISK [J].
YAMADA, T ;
HIGUCHI, Y ;
TANI, N ;
ISHIKAWA, M ;
OTA, Y ;
NAKAMURA, K ;
ITOH, A .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04) :1971-1974
[6]   CONICR/CR SPUTTERED THIN-FILM DISKS [J].
YAMADA, T ;
TANI, N ;
ISHIKAWA, M ;
OTA, Y ;
NAKAMURA, K ;
ITOH, A .
IEEE TRANSACTIONS ON MAGNETICS, 1985, 21 (05) :1429-1431