ENERGETIC PARTICLE BOMBARDMENT OF FILMS DURING MAGNETRON SPUTTERING

被引:77
作者
ROSSNAGEL, SM
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 03期
关键词
D O I
10.1116/1.576223
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
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页码:1025 / 1029
页数:5
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共 21 条
[1]   PRODUCTION OF HIGH-ENERGY NEUTRAL ATOMS BY SCATTERING OF IONS AT SOLID SURFACES AND ITS RELATION TO SPUTTERING [J].
BRODIE, I ;
LAMONT, LT ;
JEPSEN, RL .
PHYSICAL REVIEW LETTERS, 1968, 21 (17) :1224-&
[2]  
CHAPMAN B, 1980, GLOW DISCHARGE PROCE, P87
[3]   SIGNIFICANCE OF NEGATIVE-ION FORMATION IN SPUTTERING AND SIMS ANALYSIS [J].
CUOMO, JJ ;
GAMBINO, RJ ;
HARPER, JME ;
KUPTSIS, JD ;
WEBBER, JC .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02) :281-287
[4]   REFLECTION OF HEAVY-IONS [J].
ECKSTEIN, W ;
BIERSACK, JP .
ZEITSCHRIFT FUR PHYSIK B-CONDENSED MATTER, 1986, 63 (04) :471-478
[5]   EFFECT OF MONOLAYER ADSORPTION ON THE EJECTION OF ELECTRONS FROM METALS BY IONS [J].
HAGSTRUM, HD .
PHYSICAL REVIEW, 1956, 104 (06) :1516-1527
[6]   MEAN FREE PATH OF NEGATIVE-IONS IN DIODE SPUTTERING [J].
HARPER, JME ;
CUOMO, JJ ;
GAMBINO, RJ ;
KAUFMAN, HR ;
ROBINSON, RS .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (04) :1597-1600
[7]  
HARPER JME, 1984, ION BOMBARDMENT MODI, P127
[8]   A SPUTTERING WIND [J].
HOFFMAN, DW .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (03) :561-566
[9]  
KAY EK, 1989, HDB ION BEAM PROCESS
[10]   POTENTIAL AND KINETIC ELECTRON EJECTION FROM MOLYBDENUM BY ARGON IONS AND NEUTRAL ATOMS [J].
MEDVED, DB ;
LAYTON, JK ;
MAHADEVAN, P .
PHYSICAL REVIEW, 1963, 129 (05) :2086-&