共 21 条
[2]
CHAPMAN B, 1980, GLOW DISCHARGE PROCE, P87
[3]
SIGNIFICANCE OF NEGATIVE-ION FORMATION IN SPUTTERING AND SIMS ANALYSIS
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1978, 15 (02)
:281-287
[5]
EFFECT OF MONOLAYER ADSORPTION ON THE EJECTION OF ELECTRONS FROM METALS BY IONS
[J].
PHYSICAL REVIEW,
1956, 104 (06)
:1516-1527
[6]
MEAN FREE PATH OF NEGATIVE-IONS IN DIODE SPUTTERING
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1978, 15 (04)
:1597-1600
[7]
HARPER JME, 1984, ION BOMBARDMENT MODI, P127
[8]
A SPUTTERING WIND
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1985, 3 (03)
:561-566
[9]
KAY EK, 1989, HDB ION BEAM PROCESS
[10]
POTENTIAL AND KINETIC ELECTRON EJECTION FROM MOLYBDENUM BY ARGON IONS AND NEUTRAL ATOMS
[J].
PHYSICAL REVIEW,
1963, 129 (05)
:2086-&