PREPARATION OF X-RAY-LITHOGRAPHY MASKS WITH 0.1 MU-M STRUCTURES

被引：13

作者：

PARRENS, P

TABOURET, E

TACUSSEL, MC

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1979年 / 16卷 / 06期

关键词：

D O I：

10.1116/1.570367

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1965 / 1967

页数：3

共 5 条

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[2] REPLICATION OF 0.1-MUM GEOMETRIES WITH X-RAY LITHOGRAPHY
FEDER, R
SPILLER, E
TOPALIAN, J
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1332 - 1335
[3] SURFACE RELIEF STRUCTURES WITH LINEWIDTHS BELOW 2000A
FLANDERS, DC
SMITH, HI
LEHMANN, HW
WIDMER, R
SHAVER, DC
[J]. APPLIED PHYSICS LETTERS, 1978, 32 (02) : 112 - 114
[4] POLYIMIDE MEMBRANE X-RAY LITHOGRAPHY MASKS - FABRICATION AND DISTORTION MEASUREMENTS
FLANDERS, DC
SMITH, HI
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03): : 995 - 997
[5] PARIKH M, 1978, 8TH P S EL ION BEAM, P379