PREVENTION OF RESIST PATTERN COLLAPSE BY FLOOD EXPOSURE DURING RINSE PROCESS

被引：22

作者：

TANAKA, T ^{[1
]}

MORIGAMI, M ^{[1
]}

OIZUMI, H ^{[1
]}

OGAWA, T ^{[1
]}

UCHINO, S ^{[1
]}

机构：

[1] SORTEC CORP,TSUKUBA,IBARAKI 30042,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1994年 / 33卷 / 12B期

关键词：

LITHOGRAPHY; RESIST; MICROFABRICATION; RESIST PATTERN COLLAPSE; RESIST BENDING; SR LITHOGRAPHY; FLOOD EXPOSURE;

D O I：

10.1143/JJAP.33.L1803

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A resist hardening method that prevents resist pattern bending is described. In this method, a photo-crosslinking resist is flood exposed during rinsing. This exposure increases the crosslinking ratio of the resist, thus hardening the resist pattern before drying. Using this method, a 1.6-mum-thick 0.25-mum line-and-space pattern can be delineated without resist bending.

引用

页码：L1803 / L1805

页数：3

共 13 条

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