FIELD INDUCED COALESCENCE IN THIN METAL FILMS

被引：8

作者：

AHILEA, E

HIRSCH, AA

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1969年 / 6卷 / 04期

关键词：

D O I：

10.1116/1.1315733

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：698 / &

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