SURFACE OXIDATION-KINETICS OF SPUTTERING TARGETS

被引：43

作者：

MANIV, S ^{[1
]}

WESTWOOD, WD ^{[1
]}

机构：

[1] BELL NO RES, OTTAWA K1Y 4H7, ONTARIO, CANADA

来源：

SURFACE SCIENCE | 1980年 / 100卷 / 01期

关键词：

D O I：

10.1016/0039-6028(80)90447-1

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

收藏

页码：108 / 118

页数：11

相关论文

共 8 条

[1] THEORY OF THE OXIDATION OF METALS
CABRERA, N
MOTT, NF
[J]. REPORTS ON PROGRESS IN PHYSICS, 1948, 12 : 163 - 184
[2] KINETICS OF REACTIVE SPUTTER DEPOSITION OF TITANIUM OXIDES
GERAGHTY, KG
DONAGHEY, LF
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1976, 123 (08) : 1201 - 1207
[3] JOSEPHSON TUNNELING BARRIERS BY RF SPUTTER ETCHING IN AN OXYGEN PLASMA
GREINER, HJ
[J]. JOURNAL OF APPLIED PHYSICS, 1971, 42 (12) : 5151 - &
[4] THIN OXIDE FILMS ON ALUMINUM
GULBRANSEN, EA
WYSONG, WS
[J]. JOURNAL OF PHYSICAL AND COLLOID CHEMISTRY, 1947, 51 (05) : 1087 - 1103
[5] REACTIVE SPUTTERING OF METALS IN OXIDIZING ATMOSPHERES
HELLER, J
[J]. THIN SOLID FILMS, 1973, 7 (02) : 163 - 176
[6] DISCHARGE CHARACTERISTICS FOR MAGNETRON SPUTTERING OF AL IN AR AND AR-O-2 MIXTURES
MANIV, S
WESTWOOD, WD
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (03): : 743 - 751
[7] OXIDATION OF AN ALUMINUM MAGNETRON SPUTTERING TARGET IN AR-O2 MIXTURES
MANIV, S
WESTWOOD, WD
[J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (01) : 718 - 725
[8] SPECTROSCOPIC INVESTIGATION OF REACTIVE SPUTTERING OF ALUMINIUM
STIRLING, AJ
WESTWOOD, WD
[J]. THIN SOLID FILMS, 1971, 7 (01) : 1 - &