PERFORMANCE OF RESOLUTION ENHANCEMENT TECHNIQUE USING BOTH MULTIPLE EXPOSURE AND NONLINEAR RESIST

被引：5

作者：

SHIBUYA, M

KOMATSU, M

OZAWA, T

OOKI, H

机构：

[1] Optical Division, Nikon Corporation, Shinagawa-ku, okyo, 140

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1994年 / 33卷 / 12B期

关键词：

OPTICAL LITHOGRAPHY; RESIST; NONLINEAR PHOTOSENSITIVITY; 2-PHOTON ABSORPTION; MULTIPLE EXPOSURE; CUTOFF FREQUENCY;

D O I：

10.1143/JJAP.33.6874

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We have proposed a resolution enhancement lithography technique named NOLMEX. In this paper, we investigate the performance of this method by using the analytical relationship between line-and-space pattern resolution and NA, and by numerical calculation for isolated hole patterns. It is confirmed that this technique is useful for both kinds of patterns. Using the NOLMEX method, a 0.1-mu m-rule pattern can be fabricated by optical lithography.

引用

页码：6874 / 6877

页数：4

共 11 条

[1] A NEW METHOD FOR ENHANCING FOCUS LATITUDE IN OPTICAL LITHOGRAPHY - FLEX [J].

FUKUDA, H ;

HASEGAWA, N ;

TANAKA, T ;

HAYASHIDA, T .

IEEE ELECTRON DEVICE LETTERS, 1987, 8 (04) :179-180

[2] NEW APPROACH TO RESOLUTION LIMIT AND ADVANCED IMAGE-FORMATION TECHNIQUES IN OPTICAL LITHOGRAPHY [J].

FUKUDA, H ;

IMAI, A ;

TERASAWA, T ;

OKAZAKI, S .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1991, 38 (01) :67-75

[3] PHOTOLITHOGRAPHY SYSTEM USING ANNULAR ILLUMINATION [J].

KAMON, K ;

MIYAMOTO, T ;

MYOI, Y ;

NAGATA, H ;

TANAKA, M ;

HORIE, K .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (11B) :3021-3029

[4]

LEVENSON MD, 1982, IEEE T ELECTRON DEV, V29, P1826

[5] NOVEL SUPERRESOLUTION TECHNIQUE FOR OPTICAL LITHOGRAPHY - NONLINEAR MULTIPLE EXPOSURE METHOD [J].

OOKI, H ;

KOMATSU, M ;

SHIBUYA, M .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1994, 33 (2A) :L177-L179

[6]

SHIBUYA M, 1993, P SOC PHOTO-OPT INS, V1780, P117

[7]

Shibuya M., 1982, Japan Patent, Patent No. 62052

[8]

SHIBUYA M, UNPUB OPT REV

[9]

SHIBUYA M, 1993, 54TH AUT M JAP SOC A

[10]

SHIRAISHI N, 1992, P SOC PHOTO-OPT INS, V1674, P741, DOI 10.1117/12.130364

← 1 2 →