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DRIFT OF BREAKDOWN VOLTAGE IN P-N-JUNCTIONS IN SILICON (WALK-OUT)
被引:20
作者
:
VERWEY, JF
论文数:
0
引用数:
0
h-index:
0
机构:
PHILIPS RES LABS, EINDHOVEN, NETHERLANDS
PHILIPS RES LABS, EINDHOVEN, NETHERLANDS
VERWEY, JF
[
1
]
HERINGA, A
论文数:
0
引用数:
0
h-index:
0
机构:
PHILIPS RES LABS, EINDHOVEN, NETHERLANDS
PHILIPS RES LABS, EINDHOVEN, NETHERLANDS
HERINGA, A
[
1
]
DEWERDT, R
论文数:
0
引用数:
0
h-index:
0
机构:
PHILIPS RES LABS, EINDHOVEN, NETHERLANDS
PHILIPS RES LABS, EINDHOVEN, NETHERLANDS
DEWERDT, R
[
1
]
HOFSTAD, WVD
论文数:
0
引用数:
0
h-index:
0
机构:
PHILIPS RES LABS, EINDHOVEN, NETHERLANDS
PHILIPS RES LABS, EINDHOVEN, NETHERLANDS
HOFSTAD, WVD
[
1
]
机构
:
[1]
PHILIPS RES LABS, EINDHOVEN, NETHERLANDS
来源
:
SOLID-STATE ELECTRONICS
|
1977年
/ 20卷
/ 08期
关键词
:
D O I
:
10.1016/0038-1101(77)90045-4
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:689 / 695
页数:7
相关论文
共 13 条
[1]
AVALANCHE INJECTION INTO OXIDE IN SILICON GATE-CONTROLLED DEVICES .2. EXPERIMENTAL RESULTS
BULUCEA, C
论文数:
0
引用数:
0
h-index:
0
机构:
R&D INST ELECTR COMPONENTS, ICCE BANEASA, STR EROU IANCU NICOLAE 32, BUCHAREST, ROMANIA
R&D INST ELECTR COMPONENTS, ICCE BANEASA, STR EROU IANCU NICOLAE 32, BUCHAREST, ROMANIA
BULUCEA, C
[J].
SOLID-STATE ELECTRONICS,
1975,
18
(05)
: 381
-
391
[2]
AVALANCHE INJECTION INTO OXIDE IN SILICON GATE-CONTROLLED DEVICES .1. THEORY
BULUCEA, C
论文数:
0
引用数:
0
h-index:
0
机构:
ICCE BANEASA,RES & DEV INST ELECTR COMPONENTS,STR EROU IANCU NICOLAE 32,BUCHAREST,ROMANIA
ICCE BANEASA,RES & DEV INST ELECTR COMPONENTS,STR EROU IANCU NICOLAE 32,BUCHAREST,ROMANIA
BULUCEA, C
[J].
SOLID-STATE ELECTRONICS,
1975,
18
(04)
: 363
-
374
[3]
GRAAFF HCD, 1970, PHILIPS RES REP, V25, P21
[4]
ORIGIN OF CHANNEL CURRENTS ASSOCIATED WITH P+ REGIONS IN SILICON
GROVE, AS
论文数:
0
引用数:
0
h-index:
0
GROVE, AS
FITZGERALD, DJ
论文数:
0
引用数:
0
h-index:
0
FITZGERALD, DJ
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1965,
ED12
(12)
: 619
-
+
[5]
AVALANCHE DRIFT INSTABILITY IN PLANAR PASSIVATED P-N JUNCTIONS
GURTLER, RW
论文数:
0
引用数:
0
h-index:
0
GURTLER, RW
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1968,
ED15
(12)
: 980
-
+
[6]
CAPTURE CROSS-SECTION AND TRAP CONCENTRATION OF HOLES IN SILICON DIOXIDE
NING, TH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
NING, TH
[J].
JOURNAL OF APPLIED PHYSICS,
1976,
47
(03)
: 1079
-
1081
[7]
ELECTRON TRAPPING AT POSITIVELY CHARGED CENTERS IN SIO2
NING, TH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
NING, TH
OSBURN, CM
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
OSBURN, CM
YU, HN
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
YU, HN
[J].
APPLIED PHYSICS LETTERS,
1975,
26
(05)
: 248
-
250
[8]
SCHENCK JF, 1967, 6 P ANN REL PHYS S, P31
[9]
EMITTER AVALANCHE CURRENTS IN GATED TRANSISTORS
VERWEY, JF
论文数:
0
引用数:
0
h-index:
0
VERWEY, JF
DEMAAGT, BJ
论文数:
0
引用数:
0
h-index:
0
DEMAAGT, BJ
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1972,
ED19
(02)
: 245
-
+
[10]
AVALANCHE-INJECTED ELECTRON CURRENTS IN SIO2 AT HIGH INJECTION DENSITIES
VERWEY, JF
论文数:
0
引用数:
0
h-index:
0
机构:
PHILIPS RES LABS,EINDHOVEN,NETHERLANDS
PHILIPS RES LABS,EINDHOVEN,NETHERLANDS
VERWEY, JF
DEMAAGT, BJ
论文数:
0
引用数:
0
h-index:
0
机构:
PHILIPS RES LABS,EINDHOVEN,NETHERLANDS
PHILIPS RES LABS,EINDHOVEN,NETHERLANDS
DEMAAGT, BJ
[J].
SOLID-STATE ELECTRONICS,
1974,
17
(09)
: 963
-
971
←
1
2
→
共 13 条
[1]
AVALANCHE INJECTION INTO OXIDE IN SILICON GATE-CONTROLLED DEVICES .2. EXPERIMENTAL RESULTS
BULUCEA, C
论文数:
0
引用数:
0
h-index:
0
机构:
R&D INST ELECTR COMPONENTS, ICCE BANEASA, STR EROU IANCU NICOLAE 32, BUCHAREST, ROMANIA
R&D INST ELECTR COMPONENTS, ICCE BANEASA, STR EROU IANCU NICOLAE 32, BUCHAREST, ROMANIA
BULUCEA, C
[J].
SOLID-STATE ELECTRONICS,
1975,
18
(05)
: 381
-
391
[2]
AVALANCHE INJECTION INTO OXIDE IN SILICON GATE-CONTROLLED DEVICES .1. THEORY
BULUCEA, C
论文数:
0
引用数:
0
h-index:
0
机构:
ICCE BANEASA,RES & DEV INST ELECTR COMPONENTS,STR EROU IANCU NICOLAE 32,BUCHAREST,ROMANIA
ICCE BANEASA,RES & DEV INST ELECTR COMPONENTS,STR EROU IANCU NICOLAE 32,BUCHAREST,ROMANIA
BULUCEA, C
[J].
SOLID-STATE ELECTRONICS,
1975,
18
(04)
: 363
-
374
[3]
GRAAFF HCD, 1970, PHILIPS RES REP, V25, P21
[4]
ORIGIN OF CHANNEL CURRENTS ASSOCIATED WITH P+ REGIONS IN SILICON
GROVE, AS
论文数:
0
引用数:
0
h-index:
0
GROVE, AS
FITZGERALD, DJ
论文数:
0
引用数:
0
h-index:
0
FITZGERALD, DJ
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1965,
ED12
(12)
: 619
-
+
[5]
AVALANCHE DRIFT INSTABILITY IN PLANAR PASSIVATED P-N JUNCTIONS
GURTLER, RW
论文数:
0
引用数:
0
h-index:
0
GURTLER, RW
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1968,
ED15
(12)
: 980
-
+
[6]
CAPTURE CROSS-SECTION AND TRAP CONCENTRATION OF HOLES IN SILICON DIOXIDE
NING, TH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
NING, TH
[J].
JOURNAL OF APPLIED PHYSICS,
1976,
47
(03)
: 1079
-
1081
[7]
ELECTRON TRAPPING AT POSITIVELY CHARGED CENTERS IN SIO2
NING, TH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
NING, TH
OSBURN, CM
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
OSBURN, CM
YU, HN
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA
YU, HN
[J].
APPLIED PHYSICS LETTERS,
1975,
26
(05)
: 248
-
250
[8]
SCHENCK JF, 1967, 6 P ANN REL PHYS S, P31
[9]
EMITTER AVALANCHE CURRENTS IN GATED TRANSISTORS
VERWEY, JF
论文数:
0
引用数:
0
h-index:
0
VERWEY, JF
DEMAAGT, BJ
论文数:
0
引用数:
0
h-index:
0
DEMAAGT, BJ
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1972,
ED19
(02)
: 245
-
+
[10]
AVALANCHE-INJECTED ELECTRON CURRENTS IN SIO2 AT HIGH INJECTION DENSITIES
VERWEY, JF
论文数:
0
引用数:
0
h-index:
0
机构:
PHILIPS RES LABS,EINDHOVEN,NETHERLANDS
PHILIPS RES LABS,EINDHOVEN,NETHERLANDS
VERWEY, JF
DEMAAGT, BJ
论文数:
0
引用数:
0
h-index:
0
机构:
PHILIPS RES LABS,EINDHOVEN,NETHERLANDS
PHILIPS RES LABS,EINDHOVEN,NETHERLANDS
DEMAAGT, BJ
[J].
SOLID-STATE ELECTRONICS,
1974,
17
(09)
: 963
-
971
←
1
2
→