EFFECT OF HYDROGEN ON THE MICROSTRUCTURAL, OPTICAL, AND ELECTRONIC-PROPERTIES OF A-SI-H THIN-FILMS DEPOSITED BY DIRECT-CURRENT MAGNETRON REACTIVE SPUTTERING

被引：18

作者：

PINARBASI, M ^{[1
]}

MALEY, N ^{[1
]}

KUSHNER, MJ ^{[1
]}

MYERS, A ^{[1
]}

ABELSON, JR ^{[1
]}

THORNTON, JA ^{[1
]}

机构：

[1] UNIV ILLINOIS,COORDINATED SCI LAB,URBANA,IL 61801

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 03期

关键词：

D O I：

10.1116/1.576256

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1210 / 1214

页数：5

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