METALORGANIC CHEMICAL VAPOR-DEPOSITION OF BATIO3 FILMS ON MGO(100)

被引：50

作者：

NAKAZAWA, H ^{[1
]}

YAMANE, H ^{[1
]}

HIRAI, T ^{[1
]}

机构：

[1] ASAHI CHEM IND CO LTD,CORP RES LABS,KAWASAKI LAB,KAWASAKI KU,KAWASAKI 210,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1991年 / 30卷 / 9B期

关键词：

THIN FILM; CVD; BATIO3; BETA-DIKETONE CHELATE; EPITAXIAL GROWTH; A-AXIS ORIENTATION; DIELECTRIC CONSTANT;

D O I：

10.1143/JJAP.30.2200

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

BaTiO3 thin films were prepared on MgO(100) substrates by chemical vapor deposition using barium beta-diketonate {Ba(C11H19O2)2} and titanium tetraisopropoxide {Ti[OCH(CH3)2]4} as metalorganic precursors. BaTiO3 films deposited at 800-1000-degrees-C showed prominent a-axis orientation perpendicular to the substrate surface. The deposition rate of these films was 1.0-1.2-mu-m/h. The rocking curve of BaTiO3(200) reflection from the film deposited at 800-degrees-C indicated strong crystallographic orientation. The epitaxial relationship between the film and the substrate was found by X-ray pole figure analysis. The relative dielectric constant of a polycrystalline BaTiO3 film prepared on a Pt(100)/MgO(100) substrate at 800-degrees-C was 1040 (10 kHz, 20 V/cm).

引用

页码：2200 / 2203

页数：4

共 17 条

[1] EPITAXIAL-GROWTH OF THIN-FILMS OF BATIO3 USING EXCIMER LASER ABLATION
DAVIS, GM
GOWER, MC
[J]. APPLIED PHYSICS LETTERS, 1989, 55 (02) : 112 - 114
[2] AES STUDY ON THE CHEMICAL-COMPOSITION OF FERROELECTRIC BATIO3 THIN-FILMS RF SPUTTER-DEPOSITED ON SILICON
DHARMADHIKARI, VS
GRANNEMANN, WW
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (02): : 483 - 485
[3] GROWTH OF BATIO3-SRTIO3 THIN-FILMS BY RF MAGNETRON SPUTTERING
FUJIMOTO, K
KOBAYASHI, Y
KUBOTA, K
[J]. THIN SOLID FILMS, 1989, 169 (02) : 249 - 256
[4] FUSHIMI S, 1981, KAGAKUKOGYO, V25, P191
[5] PREPARATION OF FERROELECTRIC BATIO3 THIN-FILMS BY ACTIVATED REACTIVE EVAPORATION
IIJIMA, K
TERASHIMA, T
YAMAMOTO, K
HIRATA, K
BANDO, Y
[J]. APPLIED PHYSICS LETTERS, 1990, 56 (06) : 527 - 529
[6] Iijima Y., 1985, Japanese Journal of Applied Physics, Supplement, V24, P401
[7] METALORGANIC CHEMICAL VAPOR-DEPOSITION OF BATIO3 THIN-FILMS
KWAK, BS
ZHANG, K
BOYD, EP
ERBIL, A
WILKENS, BJ
[J]. JOURNAL OF APPLIED PHYSICS, 1991, 69 (02) : 767 - 772
[8] THE EPITAXIAL VAPOR DEPOSITION OF PEROVSKITE MATERIALS
MULLER, EK
NICHOLSON, BJ
TURNER, GL
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1963, 110 (09) : 969 - 973
[9] FABRICATION OF BATIO3 FILMS BY RF PLANAR-MAGNETRON SPUTTERING
NAGATOMO, T
KOSAKA, T
OMORI, S
OMOTO, O
[J]. FERROELECTRICS, 1981, 37 (1-4) : 681 - 684
[10] NAKAZAWA H, 1991, J CERAM SOC JPN, V99, P527

← 1 2 →