SILICON-OXIDE EPITAXIAL-FILMS INVESTIGATED BY NEUTRON REFLECTIVITY

被引：3

作者：

ASHWORTH, CD

MESSOLORAS, S

STEWART, RJ

WILKES, JG

BALDWIN, IS

PENFOLD, J

机构：

[1] PHILIPS COMPONENTS LTD,MILLBROOK IND ESTATE,SOUTHAMPTON SO9 7BH,HANTS,ENGLAND

[2] RUTHERFORD APPLETON LAB,DIDCOT OX11 0QX,OXON,ENGLAND

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1989年 / 22卷 / 12期

关键词：

D O I：

10.1088/0022-3727/22/12/010

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1862 / 1869

页数：8

共 17 条

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[2]

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[3]

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[8] INFLUENCE OF OXIDATION PARAMETERS ON ATOMIC ROUGHNESS AT THE SI-SIO2 INTERFACE [J].

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[9] NEUTRON REFLECTIVITY STUDIES FROM A PLATINUM CARBON MULTILAYER [J].

HARWOOD, NM ;

MESSOLORAS, S ;

STEWART, RJ ;

PENFOLD, J ;

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PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, 1988, 58 (02) :217-228

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