INTENSE NEUTRON SOURCE DEVELOPMENT FOR USE IN CANCER-THERAPY

被引:4
作者
BACON, FM
WALKO, RJ
COWGILL, DF
RIEDEL, AA
机构
关键词
D O I
10.1109/TNS.1981.4331551
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:1902 / 1905
页数:4
相关论文
共 9 条
[1]   GAS-DISCHARGE ION-SOURCE .1. DUOPLASMATRON [J].
BACON, FM .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1978, 49 (04) :427-434
[2]  
BACON FM, 1979, IEEE T NUCL SCI, V26, P1506
[3]  
BACON FM, 1980, SAND801033 SAND LABS
[4]  
BARSCHALL HH, 1976, AM SCI, V64, P668
[5]   DEUTERIUM-ION-BEAM IMPURITIES PRODUCED BY A GAS-DISCHARGE ION-SOURCE (DUOPIGATRON) [J].
BICKES, RW ;
OHAGAN, JB .
JOURNAL OF APPLIED PHYSICS, 1979, 50 (05) :3247-3249
[6]  
BRICE DK, COMMUNICATION
[7]   DYNAMIC IMPLANT PROFILING BY LOW-ENERGY NUCLEAR-REACTION SPECTROSCOPY [J].
COWGILL, DF .
NUCLEAR INSTRUMENTS & METHODS, 1977, 145 (03) :507-516
[8]  
MCDANIEL EW, 1964, COLLISION PHENOMENA, P282
[9]  
SHOPE LA, 1966, SCTM66247 SAND LABS