CRYSTAL-STRUCTURES AND ELECTRICAL-PROPERTIES OF TITANIUM FILMS EVAPORATED IN HIGH-VACUUM

被引：25

作者：

IGASAKI, Y

MITSUHASHI, H

机构：

来源：

THIN SOLID FILMS | 1978年 / 51卷 / 01期

关键词：

D O I：

10.1016/0040-6090(78)90212-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：33 / 42

页数：10

相关论文

共 18 条

[11] MUTO T, 1969, 1969 P INT SOC HYBR, P37
[12] NAKAMURA T, 1973, OYO BUTURI, V42, P491
[13] REACTIVELY EVAPORATED TITANIUM NITRIDE RESISTORS FOR MICROCIRCUITS
ODADNIK, SJ
DAS, MB
[J]. MICROELECTRONICS AND RELIABILITY, 1972, 11 (01): : 71 - &
[14] INFLUENCE OF PREFERRED ORIENTATION ON HALL EFFECT TITANIUM
ROESCH, L
WILLENS, RH
[J]. JOURNAL OF APPLIED PHYSICS, 1963, 34 (08) : 2159 - &
[15] HALL EFFECT IN SINGLE CRYSTALS OF TITANIUM
SCOVIL, GW
[J]. APPLIED PHYSICS LETTERS, 1966, 9 (06) : 247 - &
[16] X-RAY MEASUREMENT OF STACKING FAULT WIDTHS IN FCC METALS
WARREN, BE
[J]. JOURNAL OF APPLIED PHYSICS, 1961, 32 (11) : 2428 - &
[17] REACTIVELY SPUTTERED TITANIUM RESISTORS CAPACITORS AND RECTIFIERS FOR MICROCIRCUITS
WASA, K
HAYAKAWA, S
[J]. MICROELECTRONICS RELIABILITY, 1967, 6 (03) : 213 - &
[18] WASILEWSKI RJ, 1962, T METALL SOC AIME, V224, P5