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A REVIEW OF ION-BEAM-ASSISTED DEPOSITION OF OPTICAL THIN-FILMS

被引：62
作者：
MOHAN, S
KRISHNA, MG
机构：
[1] Instrumentation and Services Unit, Indian Institute of Science, Bangalore
来源：
VACUUM | 1995年 / 46卷 / 07期
关键词：
D O I：
10.1016/0042-207X(95)00001-1
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A review of the current status of ion assisted deposition of optical thin films is presented. The different kinds of ion sources and their relative merits and demerits are discussed. This is followed by a discussion of the various theoretical models currently in use to explain ion-surface interactions in such a process and finally the properties of oxide thin films deposited using ion assisted deposition are discussed.
引用
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页码：645 / 659
页数：15
相关论文
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