EFFECT OF ION ASSISTED DEPOSITION ON OPTICAL SCATTER AND SURFACE MICROSTRUCTURE OF THIN-FILMS

被引：33

作者：

ALJUMAILY, GA ^{[1
]}

MCNALLY, JJ ^{[1
]}

MCNEIL, JR ^{[1
]}

HERRMANN, WC ^{[1
]}

机构：

[1] OPT ELECTR CORP,DALLAS,TX 75243

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 03期

关键词：

D O I：

10.1116/1.572971

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：651 / 655

页数：5

共 18 条

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[2]

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[4]

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[5] DIFFUSION ENHANCEMENT DUE TO LOW-ENERGY ION-BOMBARDMENT DURING SPUTTER ETCHING AND DEPOSITION [J].

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GREENE, JE .

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[6] ION SURFACE INTERACTIONS DURING VAPOR-PHASE CRYSTAL-GROWTH BY SPUTTERING, MBE, AND PLASMA-ENHANCED CVD - APPLICATIONS TO SEMICONDUCTORS [J].

GREENE, JE ;

BARNETT, SA .

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[7]

HERRMANN WC, 1982, P SOC PHOTO OPT INST, P325

[8] MODIFICATION OF EVAPORATED CHROMIUM BY CONCURRENT ION-BOMBARDMENT [J].

HOFFMAN, DW ;

GAERTTNER, MR .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (01) :425-428

[9] RAMAN-STUDY OF STRUCTURAL TRANSFORMATIONS OF TITANIA COATINGS INDUCED BY LASER ANNEALING [J].

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SHE, CY .

APPLIED PHYSICS LETTERS, 1984, 45 (10) :1065-1067

[10] EFFECT OF ION-BOMBARDMENT ON INITIAL-STAGES OF THIN-FILM GROWTH [J].

MARINOV, M .

THIN SOLID FILMS, 1977, 46 (03) :267-274

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