CONTAMINATION ANALYSIS OF TIO2 THIN-FILMS DEPOSITED USING ION ASSISTED DEPOSITION

被引：11

作者：

ALJUMAILY, GA ^{[1
]}

WILSON, SR ^{[1
]}

BARRON, AC ^{[1
]}

MCNEIL, JR ^{[1
]}

DOYLE, BL ^{[1
]}

机构：

[1] SANDIA NATL LABS,DIV ION SOLID INTERACT 1111,ALBUQUERQUE,NM 87185

来源：

关键词：

D O I：

10.1016/0168-583X(85)90492-6

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：906 / 909

页数：4

共 8 条

[1] ARNOLD GW, 1984, P INT S NUCLEAR ACCE
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[3] CARBON-INDUCED AMORPHOUS SURFACE-LAYERS IN TI-IMPLANTED FE
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[4] ION-BEAM-ASSISTED DEPOSITION OF THIN-FILMS
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[5] ION-ASSISTED DEPOSITION OF BULKLIKE ZRO2 FILMS
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SIE, SH
[J]. APPLIED PHYSICS LETTERS, 1983, 43 (08) : 711 - 713
[6] MCNEIL JR, 1984, UNPUB APPL OPT
[7] MCNEIT JR, 1984, APPL OPTICS, V23, P559
[8] CARBURIZATION OF STEEL SURFACES DURING IMPLANTATION OF TI IONS AT HIGH FLUENCES
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (02): : 419 - 422