EXCIMER LASER CLEANING, ANNEALING, AND ABLATION OF BETA-SIC

被引：20

作者：

PEHRSSON, PE ^{[1
]}

KAPLAN, R ^{[1
]}

机构：

[1] USN,RES LAB,DIV ELECTR TECHNOL,SURFACE PHYS BRANCH,WASHINGTON,DC 20375

来源：

JOURNAL OF MATERIALS RESEARCH | 1989年 / 4卷 / 06期

关键词：

D O I：

10.1557/JMR.1989.1480

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：1480 / 1490

页数：11

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