SELECTIVE NUCLEATION AND GROWTH OF DIAMOND PARTICLES BY PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION

被引：67

作者：

MA, JS

KAWARADA, H

YONEHARA, T

SUZUKI, J

WEI, J

YOKOTA, Y

HIRAKI, A

机构：

来源：

APPLIED PHYSICS LETTERS | 1989年 / 55卷 / 11期

关键词：

D O I：

10.1063/1.101708

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1071 / 1073

页数：3

共 12 条

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[3] ELECTRICAL CHARACTERISTICS OF SCHOTTKY DIODES FABRICATED USING PLASMA ASSISTED CHEMICAL VAPOR-DEPOSITED DIAMOND FILMS
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[J]. APPLIED PHYSICS LETTERS, 1988, 53 (07) : 586 - 588
[4] SELECTIVE DEPOSITION OF DIAMOND CRYSTALS BY CHEMICAL VAPOR-DEPOSITION USING A TUNGSTEN-FILAMENT METHOD
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[J]. APPLIED PHYSICS LETTERS, 1988, 53 (19) : 1815 - 1817
[5] DIAMOND SYNTHESIS FROM GAS-PHASE IN MICROWAVE PLASMA
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[J]. JOURNAL OF CRYSTAL GROWTH, 1983, 62 (03) : 642 - 644
[6] LARGE AREA CHEMICAL VAPOR-DEPOSITION OF DIAMOND PARTICLES AND FILMS USING MAGNETOMICROWAVE PLASMA
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MAR, KS
HIRAKI, A
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1987, 26 (06): : L1032 - L1034
[7] BLUE AND GREEN CATHODOLUMINESCENCE OF SYNTHESIZED DIAMOND FILMS FORMED BY PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION
KAWARADA, H
NISHIMURA, K
ITO, T
SUZUKI, J
MAR, KS
YOKOTA, Y
HIRAKI, A
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1988, 27 (04): : L683 - L686
[8] VAPOR-DEPOSITION OF DIAMOND PARTICLES FROM METHANE
MATSUMOTO, S
SATO, Y
KAMO, M
SETAKA, N
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1982, 21 (04): : L183 - L185
[9] GROWTH OF DIAMOND THIN-FILMS BY ELECTRON-ASSISTED CHEMICAL VAPOR-DEPOSITION AND THEIR CHARACTERIZATION
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INUZUKA, T
[J]. THIN SOLID FILMS, 1986, 137 (01) : 89 - 99
[10] VIVILOV VS, 1980, SOV PHYS SEMICOND, V14, P1078

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