REACTION-MECHANISMS FOR THE PHOTON-ENHANCED ETCHING OF SEMICONDUCTORS - AN INVESTIGATION OF THE UV-STIMULATED INTERACTION OF CHLORINE WITH SI(100)

被引：101

作者：

JACKMAN, RB

EBERT, H

FOORD, JS

机构：

来源：

SURFACE SCIENCE | 1986年 / 176卷 / 1-2期

关键词：

D O I：

10.1016/0039-6028(86)90171-8

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

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页码：183 / 192

页数：10

相关论文

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