FAR-INFRARED ABSORPTION OF SILICON-CRYSTALS

被引：51

作者：

OHBA, T

IKAWA, S

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 64卷 / 08期

关键词：

D O I：

10.1063/1.341325

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4141 / 4143

页数：3

共 11 条

[1] SUBMILLIMETER WAVE MEASUREMENTS OF OPTICAL-CONSTANTS OF WATER AT VARIOUS TEMPERATURES [J].

AFSAR, MN ;

HASTED, JB .

INFRARED PHYSICS, 1978, 18 (5-6) :835-841

[2]

BORN M, 1970, PRINCIPLES OPTICS, P624

[3]

Edwards D. F., 1985, HDB OPTICAL CONSTANT, P547

[4]

Iizuka T., 1982, Oyo Buturi, V51, P1269

[5] MEASUREMENT OF FAR-INFRARED OPTICAL-CONSTANTS BY ATR [J].

IKAWA, S ;

OHBA, T ;

TANAKA, S ;

MORIMOTO, Y ;

FUKUSHI, K ;

KIMURA, M .

INTERNATIONAL JOURNAL OF INFRARED AND MILLIMETER WAVES, 1985, 6 (04) :287-306

[6] INVESTIGATION OF THE COMPLEX PERMITTIVITY OF N-TYPE SILICON AT MILLIMETER WAVELENGTHS [J].

KINASEWITZ, RT ;

SENITZKY, B .

JOURNAL OF APPLIED PHYSICS, 1983, 54 (06) :3394-3398

[7] OPTICAL-CONSTANTS OF FRA INFRARED MATERIALS .2. CRYSTALLINE SOLIDS [J].

LOEWENSTEIN, EV ;

SMITH, DR ;

MORGAN, RL .

APPLIED OPTICS, 1973, 12 (02) :398-406

[8] FAR-INFRARED OPTICAL-CONSTANTS OF LIQUID ACETONITRILE AS MEASURED BY A LASER ATTENUATED TOTAL REFLECTION METHOD [J].

OHBA, T ;

IKAWA, S ;

KIMURA, M .

CHEMICAL PHYSICS LETTERS, 1985, 117 (05) :397-399

[9] DRIFT MOBILITIES IN SEMICONDUCTORS .2. SILICON [J].

PRINCE, MB .

PHYSICAL REVIEW, 1954, 93 (06) :1204-1206

[10] FAR-INFRARED INTERFERENCE TECHNIQUE FOR DETERMINING EPITAXIAL SILICON THICKNESS [J].

SAIFI, MA ;

STOLEN, RH .

JOURNAL OF APPLIED PHYSICS, 1972, 43 (03) :1171-&

← 1 2 →