INTERNAL-STRESS IN ALUMINUM-OXIDE, TITANIUM CARBIDE AND COPPER-FILMS OBTAINED BY PLANAR MAGNETRON SPUTTERING

被引:25
作者
KUWAHARA, K
SUMOMOGI, T
KONDO, M
机构
关键词
D O I
10.1016/0040-6090(81)90416-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:41 / 47
页数:7
相关论文
共 17 条
[11]   INTERNAL-STRESSES IN TITANIUM, NICKEL, MOLYBDENUM, AND TANTALUM FILMS DEPOSITED BY CYLINDRICAL MAGNETRON SPUTTERING [J].
THORNTON, JA ;
HOFFMAN, DW .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01) :164-168
[12]   INTERNAL-STRESSES IN METALLIC-FILMS DEPOSITED BY CYLINDRICAL MAGNETRON SPUTTERING [J].
THORNTON, JA ;
TABOCK, J ;
HOFFMAN, DW .
THIN SOLID FILMS, 1979, 64 (01) :111-119
[13]   ISOTROPIC STRESS MEASUREMENTS IN PERMALLOY FILMS [J].
WEISS, GP ;
SMITH, DO .
JOURNAL OF APPLIED PHYSICS, 1962, 33 (03) :1166-&
[14]   GAS INCORPORATION INTO SPUTTERED FILMS [J].
WINTERS, HF ;
KAY, E .
JOURNAL OF APPLIED PHYSICS, 1967, 38 (10) :3928-&
[15]   INTRINSIC STRESS OF MAGNETRON-SPUTTERED NIOBIUM FILMS [J].
WU, CT .
THIN SOLID FILMS, 1979, 64 (01) :103-110
[16]  
1973, HDB TABLES APPLIED E
[17]  
[No title captured]