PRESENCE OF DEEP LEVELS IN ION IMPLANTED JUNCTIONS

被引:17
作者
HUNSPERGER, RG
MARSH, OJ
MEAD, CA
机构
关键词
D O I
10.1063/1.1652619
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:295 / +
页数:1
相关论文
共 5 条
[1]   ZN AND TE IMPLANTATIONS INTO GAAS [J].
MAYER, JW ;
MARSH, OJ ;
MANKARIOUS, R ;
BOWER, R .
JOURNAL OF APPLIED PHYSICS, 1967, 38 (04) :1975-+
[2]  
SAH G, 1964, IEEE T ELECTRON DEV, VED11, P345
[3]   EFFECTS OF DEEP IMPURITIES ON N+P JUNCTION REVERSE-BIASED SMALL-SIGNAL CAPACITANCE [J].
SCHIBLI, E ;
MILNES, AG .
SOLID-STATE ELECTRONICS, 1968, 11 (03) :323-+
[4]  
SIGMUND P, 1967, MAY C APPL ION BEAMS
[5]  
Thonsen P.V., 1963, KGL DAN SELSK MAT FY, V33, P1