HETEROEPITAXIAL GROWTH OF CUBIC GAN ON GAAS BY GAS-SOURCE MOLECULAR-BEAM EPITAXY

被引:30
作者
YOSHIDA, S
OKUMURA, H
MISAWA, S
SAKUMA, E
机构
[1] Electrotechnical Laboratory, Tsukuba, Ibaraki, 305
关键词
D O I
10.1016/0039-6028(92)91086-Q
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
GaAs and GaN were grown epitaxially on GaAs substrates by gas-source molecular beam epitaxy using diethylarsine (DEAs) and dimethylhydrazine (DMHy) as As and N sources, respectively. It was found that cubic GaN grows on nitrided GaAs(001) surfaces, in contrast with the growth of hexagonal GaN on GaAs(111) surfaces. Cathodoluminescence spectra suggest that cubic GaN has about a 0.4 eV larger band gap energy than that of the hexagonal one. It was also found that GaAs preferentially grows to GaN when DEAs and DMHy beams are supplied with a Ga beam onto the substrates simultaneously. Thus, only by intermittent supply of a DEAs beam, GaN/GaAs multilayers were obtained.
引用
收藏
页码:50 / 53
页数:4
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