ISOTHERMAL SILICON LIQUID-PHASE EPITAXY FROM SUPER-SATURATED TIN

被引：14

作者：

BALIGA, BJ

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1978年 / 125卷 / 04期

关键词：

D O I：

10.1149/1.2131508

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：598 / 600

页数：3

共 9 条

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[4]

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[5] LIQUID-PHASE EPITAXIAL-GROWTH KINETICS OF MAGNETIC GARNET FILMS GROWN BY ISOTHERMAL DIPPING WITH AXIAL ROTATION [J].

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[6] LIQUID-PHASE EPITAXY OF SILICON AT VERY LOW-TEMPERATURES [J].

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JOURNAL OF CRYSTAL GROWTH, 1977, 37 (02) :169-177

[7]

HSIEH JJ, 1974, J CRYST GROWTH, V27, P49, DOI 10.1016/0022-0248(74)90418-7

[8] LIQUID-PHASE EPITAXIAL-GROWTH OF SILICON IN SELECTED AREAS [J].

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JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (10) :1394-&

[9] GERMANIUM AND SILICON LIQUIDUS CURVES [J].

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