ETCHING OF POLYMERS BY OXYGEN PLASMAS - INFLUENCE OF VISCOELASTIC PROPERTIES

被引：24

作者：

JOUBERT, O

PANIEZ, P

PELLETIER, J

PONS, M

机构：

[1] Centre National d'Etudes des Télécommunications, 38243 Meylan Cedex

来源：

APPLIED PHYSICS LETTERS | 1991年 / 58卷 / 09期

关键词：

D O I：

10.1063/1.104455

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A study of novolac polymer etching in an oxygen microwave multipolar plasma with independent rf wafer biasing is reported. A step-like etch rate variation with temperature is observed for these polymers. Experiments conducted on chemically identical novolacs with different molecular weights allow this phenomenon to be correlated with their glass transition temperatures. Etch rate variations are caused by the thermal effect of ion bombardment, emphasizing the role of viscoelastic properties in polymer plasma etching.

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页码：959 / 961

页数：3

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