NEW SCANNING TUNNELING MICROSCOPY TIP FOR MEASURING SURFACE-TOPOGRAPHY

被引：165

作者：

AKAMA, Y ^{[1
]}

NISHIMURA, E ^{[1
]}

SAKAI, A ^{[1
]}

MURAKAMI, H ^{[1
]}

机构：

[1] TSUKUBA RES CTR,ELECTROTECH LAB,TSUKUBA 305,JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1990年 / 8卷 / 01期

关键词：

D O I：

10.1116/1.576413

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Electron-beam deposition inside scanning electron microscope (SEM) is used to prepare a new scanning tunneling microscope (STM) tip [electron-beam deposited (EBD) tip] which has a submicron diameter and a long straight sidewall. An EBD tip as small as less than 0.1 μm in diameter can be formed with careful beam focusing. This EBD tip is formed to be capable of providing a low-distortion STM image of deep grooves, and is quite useful in topographic measurements of microfabricated patterns. © 1990, American Vacuum Society. All rights reserved.

引用

页码：429 / 433

页数：5

共 3 条

[1] ELECTRON-BEAM FABRICATION OF 80-A METAL STRUCTURES [J].

BROERS, AN ;

MOLZEN, WW ;

CUOMO, JJ ;

WITTELS, ND .

APPLIED PHYSICS LETTERS, 1976, 29 (09) :596-598

[2] INSITU OBSERVATION ON ELECTRON-BEAM INDUCED CHEMICAL VAPOR-DEPOSITION BY TRANSMISSION ELECTRON-MICROSCOPY [J].

ICHIHASHI, T ;

MATSUI, S .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06) :1869-1872

[3] OBSERVATION OF MICROFABRICATED PATTERNS BY SCANNING TUNNELING MICROSCOPY [J].

OKAYAMA, S ;

KOMURO, M ;

MIZUTANI, W ;

TOKUMOTO, H ;

OKANO, M ;

SHIMIZU, K ;

KOBAYASHI, Y ;

MATSUMOTO, F ;

WAKIYAMA, S ;

SHIGENO, M ;

SAKAI, F ;

FUJIWARA, S ;

KITAMURA, O ;

ONO, M ;

KAJIMURA, K .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (02) :440-444

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