EFFECT OF SUBSTRATE-TEMPERATURE AND DEPOSITION RATE ON THE PHOTOCONDUCTIVITY OF SPUTTERED A-SI-H

被引：8

作者：

HAMDI, H

DENEUVILLE, A

BRUYERE, JC

机构：

来源：

JOURNAL DE PHYSIQUE LETTRES | 1980年 / 41卷 / 20期

关键词：

D O I：

10.1051/jphyslet:019800041020048300

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：L483 / L486

页数：4

共 16 条

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[3]

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[4]

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[5]

BRUYERE JC, 1980, J PHYS LETT-PARIS, V41, pL31, DOI 10.1051/jphyslet:0198000410203100

[6] HYDROGEN AND MATRIX EFFECT ON THE OPTICAL GAP OF SPUTTERED A-SI-H [J].

DENEUVILLE, A ;

BRUYERE, JC ;

MINI, A ;

KAHIL, H ;

DANIELOU, R ;

LIGEON, E .

JOURNAL OF NON-CRYSTALLINE SOLIDS, 1980, 35-6 (JAN-) :469-473

[7]

DENEUVILLE A, UNPUBLISHED

[8]

HAMDI H, UNPUBLISHED

[9] DEFECTS IN PLASMA-DEPOSITED A-SI-H [J].

KNIGHTS, JC ;

LUCOVSKY, G ;

NEMANICH, RJ .

JOURNAL OF NON-CRYSTALLINE SOLIDS, 1979, 32 (1-3) :393-403

[10] STRUCTURAL INTERPRETATION OF THE VIBRATIONAL-SPECTRA OF A-SI-H ALLOYS [J].

LUCOVSKY, G ;

NEMANICH, RJ ;

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PHYSICAL REVIEW B, 1979, 19 (04) :2064-2073

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