High quality YBa2Cu3O7-x films have been grown on MgO epitaxial buffer layers deposited onto a GaAs/AlGaAs heterostructure incorporating a two-dimensional electron gas (2DEG). The critical temperature of the YBa2Cu3O7-x, T(c)(0) was > 80 K, and J(c) > 2 X 10(4) A/cm2 at 77 K. Electron mobilities and concentrations of 2DEG substrates were measured at different stages in the formation of YBa2Cu3O7-x/MgO/2DEG structure. Room-temperature mobilities and concentrations were unchanged after YBa2Cu3O7-x/MgO deposition, while low-temperature mobilities were slightly degraded. It is found that the degradation of electron mobility is correlated to the high growth temperature of YBa2Cu3O7-x. Since the 2DEG is only 1200 angstrom from the substrate surface, this constitutes a sensitive demonstration of the viability of the semiconductor substrate under these growth conditions.