TEMPERATURE-DEPENDENT MOBILITY OF A GAAS/ALGAAS HETEROSTRUCTURE AFTER DEPOSITION OF MGO AND SUPERCONDUCTING YBA2CU3O7-X

被引:10
作者
TSENG, MZ [1 ]
NGUYEN, C [1 ]
TARSA, E [1 ]
CHANG, LD [1 ]
HU, EL [1 ]
KROEMER, H [1 ]
机构
[1] UNIV CALIF SANTA BARBARA,DEPT MAT ENGN,SANTA BARBARA,CA 93106
关键词
D O I
10.1063/1.107849
中图分类号
O59 [应用物理学];
学科分类号
摘要
High quality YBa2Cu3O7-x films have been grown on MgO epitaxial buffer layers deposited onto a GaAs/AlGaAs heterostructure incorporating a two-dimensional electron gas (2DEG). The critical temperature of the YBa2Cu3O7-x, T(c)(0) was > 80 K, and J(c) > 2 X 10(4) A/cm2 at 77 K. Electron mobilities and concentrations of 2DEG substrates were measured at different stages in the formation of YBa2Cu3O7-x/MgO/2DEG structure. Room-temperature mobilities and concentrations were unchanged after YBa2Cu3O7-x/MgO deposition, while low-temperature mobilities were slightly degraded. It is found that the degradation of electron mobility is correlated to the high growth temperature of YBa2Cu3O7-x. Since the 2DEG is only 1200 angstrom from the substrate surface, this constitutes a sensitive demonstration of the viability of the semiconductor substrate under these growth conditions.
引用
收藏
页码:601 / 603
页数:3
相关论文
共 6 条
[1]   EPITAXIAL MGO BUFFER LAYERS FOR YBA2CU3O7-X THIN-FILM ON GAAS [J].
CHANG, LD ;
TSENG, MZ ;
HU, EL ;
FORK, DK .
APPLIED PHYSICS LETTERS, 1992, 60 (14) :1753-1755
[2]   INSITU YBA2CU3O7-X SUPERCONDUCTOR FILMS ON GAAS/ALAS SUPERLATTICES [J].
CHANG, LD ;
TSENG, MZ ;
SAMOSKA, LA ;
OSHEA, JJ ;
LI, YJ ;
CAINE, EJ ;
HU, EL ;
PETROFF, PM ;
KROEMER, H .
JOURNAL OF APPLIED PHYSICS, 1991, 70 (09) :5108-5110
[3]   EPITAXIAL YBA2CU3O7-DELTA ON GAAS(001) USING BUFFER LAYERS [J].
FORK, DK ;
NASHIMOTO, K ;
GEBALLE, TH .
APPLIED PHYSICS LETTERS, 1992, 60 (13) :1621-1623
[4]   THE EFFECT OF GROWTH TEMPERATURE ON THE MOBILITY OF TWO-DIMENSIONAL ELECTRON-GAS IN SELECTIVELY DOPED GAAS-N-ALGAAS HETEROSTRUCTURES GROWN BY MBE [J].
HIYAMIZU, S ;
FUJII, T ;
MIMURA, T ;
NANBU, K ;
SAITO, J ;
HASHIMOTO, H .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1981, 20 (06) :L455-L458
[5]   THE EFFECT OF ANNEALING ON THE ELECTRICAL-PROPERTIES OF SELECTIVELY DOPED GAAS/N-ALGAAS HETEROJUNCTION STRUCTURES GROWN BY MBE [J].
ISHIKAWA, T ;
HIYAMIZU, S ;
MIMURA, T ;
SAITO, J ;
HASHIMOTO, H .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1981, 20 (11) :L814-L816
[6]  
Tseng M. R., UNPUB