REACTIVE RAPID SEQUENTIAL PULSE LASER DEPOSITION OF YBA2CU3O7 - A CANDIDATE TO ELIMINATE PARTICULATE FORMATION

被引：10

作者：

WATANABE, Y

机构：

[1] Mitsubishi Kasei Research Center

来源：

APPLIED PHYSICS LETTERS | 1994年 / 64卷 / 10期

关键词：

D O I：

10.1063/1.110869

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We propose a modified version of pulsed laser deposition: rapid sequential pulsed laser deposition. In this method, different metal elements are sequentially deposited onto a substrate in a fixed stoichiometric ratio in a very short period of time. This method allows a flexible choice of target material and of laser power density, which may solve the particulate problem intrinsic to a conventional laser ablation. We show results of an in situ formation of YBa2Cu3O7 thin film as a demonstration of this method.

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页码：1295 / 1297

页数：3

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