CHARACTERIZATION OF A PERMANENT-MAGNET ELECTRON-CYCLOTRON RESONANCE PLASMA SOURCE

被引：21

作者：

MANTEI, TD

DHOLE, S

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1991年 / 9卷 / 01期

关键词：

D O I：

10.1116/1.585785

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Experimental details and results are presented for a permanent magnet electron cyclotron resonance plasma source matched to a multipolar confined process chamber. A Nd-Fe-B magnet structure provides a resonant axial magnetic field with no electrical or cooling input power, replacing the more typical current driven coils. Plasma parameter and etch characterization measurements in Ar and SF6 are presented for the pressure range 0.1-1.0 mTorr and input microwave power levels 100-500 W.

引用

页码：26 / 28

页数：3

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