CHARACTERIZATION AND OPTIMIZATION OF CERIUM DIOXIDE FILMS DEPOSITED BY RF MAGNETRON SPUTTERING

被引：33

作者：

SUNDARAM, KB

WAHID, PF

SISK, PJ

机构：

[1] Department of Electrical and Computer Engineering, University of Central Florida, Orlando

来源：

THIN SOLID FILMS | 1992年 / 221卷 / 1-2期

关键词：

D O I：

10.1016/0040-6090(92)90788-D

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Cerium dioxide (CeO2) films were deposited on glass substrates by an r.f. magnetron sputtering process. The deposition rates were studied as a function of the molar fraction of oxygen in the system for various input power levels. The deposition conditions were optimized to obtain good quality films for optical transmission.

引用

页码：13 / 16

页数：4

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